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27 March 2017 High-NA metrology and sensing on Berkeley MET5
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In this paper we compare two non-interferometric wavefront sensors suitable for in-situ high-NA EUV optical testing. The first is the AIS sensor, which has been deployed in both inspection and exposure tools. AIS is a compact, optical test that directly measures a wavefront by probing various parts of the imaging optic pupil and measuring localized wavefront curvature. The second is an image-based technique that uses an iterative algorithm based on simulated annealing to reconstruct a wavefront based on matching aerial images through focus. In this technique, customized illumination is used to probe the pupil at specific points to optimize differences in aberration signatures.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryan Miyakawa, Chris Anderson, and Patrick Naulleau "High-NA metrology and sensing on Berkeley MET5", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101430N (27 March 2017);

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