Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema; Yu Zhang; Michaela Vockenhuber; Dimitrios Kazazis; Yasin Ekinci; Albert M. Brouwer

doi:10.1117/12.2257911

24 March 2017 Extreme ultraviolet patterning of tin-oxo cages

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, Albert M. Brouwer

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 1014325 (2017) https://doi.org/10.1117/12.2257911
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages: molecular building blocks that are known to turn insoluble upon EUV exposure, thus having the properties of a negative tone photoresist. In this work, we focus on contrast curves of the materials using open-frame EUV exposures and their patterning capabilities using EUV interference lithography. It is shown that baking steps, such as post-exposure baking (PEB) can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. In addition, we show that the exchange of the anions of the cage can make a difference in terms of their physical properties. Our results demonstrate the significance of process optimization while evaluating the resist performance of novel molecular materials.

Citation Download Citation

Jarich Haitjema, Yu Zhang, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci, and Albert M. Brouwer "Extreme ultraviolet patterning of tin-oxo cages", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014325 (24 March 2017); https://doi.org/10.1117/12.2257911

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