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21 March 2017 Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications
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Directed Self Assembly (DSA) of block-copolymers (BCPs) used as a complementary technique to the 193nm immersion lithography has demonstrated sub-10nm node applications in both via and line/space patterning. We propose however to study the performance of graphoepitaxy which allows DSA with thicker initial BCP layer, higher multiplication factors and stronger orientation control of lamellae. The aim of this work is to use the 300mm pilot line available at LETI and Arkema’s advanced materials to evaluate the performances of a novel graphoepitaxy process based on the work on a 38nm period lamellar PS-b-PMMA (L38) reported before.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Claveau, M. Argoud, P. Pimenta-Barros, G. Chamiot-Maitral, R. Tiron, X. Chevalier, and C. Navarro "Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications", Proc. SPIE 10144, Emerging Patterning Technologies, 1014411 (21 March 2017);

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