Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications

G. Claveau; M. Argoud; P. Pimenta-Barros; G. Chamiot-Maitral; R. Tiron; X. Chevalier; C. Navarro

doi:10.1117/12.2257969

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21 March 2017 Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications

G. Claveau, M. Argoud, P. Pimenta-Barros, G. Chamiot-Maitral, R. Tiron, X. Chevalier, C. Navarro

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Proceedings Volume 10144, Emerging Patterning Technologies; 1014411 (2017) https://doi.org/10.1117/12.2257969
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Directed Self Assembly (DSA) of block-copolymers (BCPs) used as a complementary technique to the 193nm immersion lithography has demonstrated sub-10nm node applications in both via and line/space patterning. We propose however to study the performance of graphoepitaxy which allows DSA with thicker initial BCP layer, higher multiplication factors and stronger orientation control of lamellae. The aim of this work is to use the 300mm pilot line available at LETI and Arkema’s advanced materials to evaluate the performances of a novel graphoepitaxy process based on the work on a 38nm period lamellar PS-b-PMMA (L38) reported before.

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G. Claveau, M. Argoud, P. Pimenta-Barros, G. Chamiot-Maitral, R. Tiron, X. Chevalier, and C. Navarro "Latest evolution in a 300mm graphoepitaxy pilot line flow for L/S applications", Proc. SPIE 10144, Emerging Patterning Technologies, 1014411 (21 March 2017); https://doi.org/10.1117/12.2257969

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