Reduction and control of intrafield focus variation on 7nm technology

Jennifer Shumway; Nathan Neal; Sheldon Meyers; Jens Reichelt; Young Ki Kim; Justin Hanson; Ferhad Kamalizadeh; Dionysios Petromanolakis; Youri van Dommelen; Robert Bonanni; Arjan Gijsbertsen

doi:10.1117/12.2258391

22 January 2018 Reduction and control of intrafield focus variation on 7nm technology

Jennifer Shumway, Nathan Neal, Sheldon Meyers, Jens Reichelt, Young Ki Kim, Justin Hanson, Ferhad Kamalizadeh, Dionysios Petromanolakis, Youri van Dommelen, Robert Bonanni, Arjan Gijsbertsen

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Proceedings Volume 10147, Optical Microlithography XXX; 101470B (2018) https://doi.org/10.1117/12.2258391
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

With each technology node, overall focus budgets have become increasingly tighter in order to meet the necessary product requirements. The 7nm node has required us to define new opportunities for addressing top contributors to the focus budget. Field curvature in particular has been identified as a key contributor to the intrafield focus budget, contributing around 50%. This paper will introduce two new methodologies for improving field curvature; one a hardware solution and one a software solution.

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Jennifer Shumway, Nathan Neal, Sheldon Meyers, Jens Reichelt, Young Ki Kim, Justin Hanson, Ferhad Kamalizadeh, Dionysios Petromanolakis, Youri van Dommelen, Robert Bonanni, and Arjan Gijsbertsen "Reduction and control of intrafield focus variation on 7nm technology", Proc. SPIE 10147, Optical Microlithography XXX, 101470B (22 January 2018); https://doi.org/10.1117/12.2258391

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