Paper
30 March 2017 Pattern database applications from design to manufacturing
Linda Zhuang, Annie Zhu, Yifan Zhang, Jason Sweis, Ya-Chieh Lai
Author Affiliations +
Abstract
Pattern-based approaches are becoming more common and popular as the industry moves to advanced technology nodes. At the beginning of a new technology node, a library of process weak point patterns for physical and electrical verification are starting to build up and used to prevent known hotspots from re-occurring on new designs. Then the pattern set is expanded to create test keys for process development in order to verify the manufacturing capability and precheck new tape-out designs for any potential yield detractors. With the database growing, the adoption of pattern-based approaches has expanded from design flows to technology development and then needed for mass-production purposes. This paper will present the complete downstream working flows of a design pattern database(PDB). This pattern-based data analysis flow covers different applications across different functional teams from generating enhancement kits to improving design manufacturability, populating new testing design data based on previous-learning, generating analysis data to improve mass-production efficiency and manufacturing equipment in-line control to check machine status consistency across different fab sites.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Linda Zhuang, Annie Zhu, Yifan Zhang, Jason Sweis, and Ya-Chieh Lai "Pattern database applications from design to manufacturing", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481F (30 March 2017); https://doi.org/10.1117/12.2259934
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KEYWORDS
Optical proximity correction

Manufacturing

Inspection

Databases

Design for manufacturability

Product engineering

Statistical analysis

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