Intrinsic Mechanical Stresses In Sputtered Aluminium Films

Roland Zarwasch; Eduard P. Rille; Hans K . Pulker

doi:10.1117/12.950027

27 February 1989 Intrinsic Mechanical Stresses In Sputtered Aluminium Films

Roland Zarwasch, Eduard P. Rille, Hans K . Pulker

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950027
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

By means of an optical in-situ stress monitor the intrinsic mechanical stresses in at various working gas pressures dc magnetron sputtered Al films were measured. At 0.1 Pa argon pressure the Al films showed compressive stresses, which decreased as the pressure was increased. The chemical composition of the films was investigated by AES and electron-beam microprobe. The content of oxygen and carbon was highest at high working gas pressures and low deposition rates. The argon content of all films was to small to be detected by microprobe analysis.

Citation Download Citation

Roland Zarwasch, Eduard P. Rille, and Hans K . Pulker "Intrinsic Mechanical Stresses In Sputtered Aluminium Films", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950027

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