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27 February 1989 Modern Optical Coating Technologies
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Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950029
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Highest quality dielectric films are required today for various interference optical applications and for planar wave guides in integrated optics. Many inorganic chemical compounds which were difficult to deposit by conventional techniques in form of well adherent, dense, hard and stable low-loss films are now routinly synthesized by reactive gas discharge plasma and energetic ion and/or coating materials atom processes. A survey over such PVD coating technologies and on the resulting film properties is given in this paper.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans K. Pulker "Modern Optical Coating Technologies", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950029
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