Radio frequency sputtered AlxNy thin films for thermal detectors

Nicholas Calvano; Philip Chrostoski; Andrew Voshell; Keesean Braithwaite; Dennis Prather; Murzy Jhabvala; Mukti Rana

doi:10.1117/12.2267089

28 April 2017 Radio frequency sputtered Al_xN_y thin films for thermal detectors

Nicholas Calvano, Philip Chrostoski, Andrew Voshell, Keesean Braithwaite, Dennis Prather, Murzy Jhabvala, Mukti Rana

Proceedings Volume 10209, Image Sensing Technologies: Materials, Devices, Systems, and Applications IV; 102090J (2017) https://doi.org/10.1117/12.2267089
Event: SPIE Commercial + Scientific Sensing and Imaging, 2017, Anaheim, CA, United States

Abstract

This work presents the deposition and characterization of Al_xN_y thin films for using them as pyroelectric detector material. To test the pyroelectric effect, capacitors with Au electrodes were fabricated. The diameter of the electrodes for capacitor used was 1100 μm while the distances between these two electrodes was 2200 μm. On a 3- inch diameter cleaned silicon wafer a 100-nm thick Al_xN_y films were deposited using an Al target and Ar:N₂ = 1:1 flow and 5 mTorr chamber pressure. Finally, a 100-nm thick Au layer was deposited and lifted off by using conventional photo lithography to form the electrodes of capacitors. All the layers were deposited by radio frequency sputtering at room temperature. The Al_xN_y thin films were annealed at 700 ⁰C in N₂ environment for 10 minutes. X-ray diffraction showed that the films are poly-crystalline with peaks in (100), (002) and (101) directions. The pyroelectric current increased from 3.38 × 10^-14A at 303 K to 1.75 × 10^-13 at 353 K. When the temperature varied between 303 K to 353 K the pyroelectric coefficient was increased from 8.60 × 10^-9 C/m²K to 3.76 × 10^-8 C/m²K while the loss tangent remains almost constant to ~1.5 × 10^-5 when the temperature was varied in the same range.

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Citation Download Citation

Nicholas Calvano, Philip Chrostoski, Andrew Voshell, Keesean Braithwaite, Dennis Prather, Murzy Jhabvala, and Mukti Rana "Radio frequency sputtered Al_xN_y thin films for thermal detectors", Proc. SPIE 10209, Image Sensing Technologies: Materials, Devices, Systems, and Applications IV, 102090J (28 April 2017); https://doi.org/10.1117/12.2267089

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