Photoinduced χ(2) for second harmonic generation in stoichiometric silicon nitride waveguides

Marco A. G. Porcel; Jesse Mak; Caterina Taballione; Victoria K. Schermerhorn; Jörn P. Epping; Peter J. M. van der Slot; Klaus-J. Boller

doi:10.1117/12.2265797

16 May 2017 Photoinduced χ⁽²⁾ for second harmonic generation in stoichiometric silicon nitride waveguides

Marco A. G. Porcel, Jesse Mak, Caterina Taballione, Victoria K. Schermerhorn, Jörn P. Epping, Peter J. M. van der Slot, Klaus-J. Boller

Author Affiliations +

Proceedings Volume 10228, Nonlinear Optics and Applications X; 102280R (2017) https://doi.org/10.1117/12.2265797
Event: SPIE Optics + Optoelectronics, 2017, Prague, Czech Republic

Abstract

We present for the first time second harmonic generation in amorphous stoichiometric Si₃N₄ waveguides grown via low pressure chemical vapor deposition. An effective second-order susceptibility (χ ⁽²⁾) is established via the coherent photogalvanic effect. A waveguide was designed to phase match a horizontally (parallel to the waveguide width) polarized hybrid EH₀₀ mode at 1064 nm with the higher-order hybrid transverse EH₀₂ mode at 532 nm. A mode-locked laser delivering 6.2-ps pulses at 1064 nm with a repetition rate of 20 MHz was used as pump. When pumped with a constant average power, it was found that the photoinduced χ ⁽²⁾ is established over a time of the order of 1000 s in as-manufactured waveguides, during which the second harmonic signal grows from below noise to a saturation value. The life-time of the photoinduced χ ⁽²⁾ is at least a week. In steady state, we obtain a maximum conversion efficiency close to 0.4% for an average pump power of 13 mW inside the waveguide. The effective second-order susceptibility is found to be 8.6 pm/V.

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Marco A. G. Porcel, Jesse Mak, Caterina Taballione, Victoria K. Schermerhorn, Jörn P. Epping, Peter J. M. van der Slot, and Klaus-J. Boller "Photoinduced χ⁽²⁾ for second harmonic generation in stoichiometric silicon nitride waveguides", Proc. SPIE 10228, Nonlinear Optics and Applications X, 102280R (16 May 2017); https://doi.org/10.1117/12.2265797

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