Paper
30 May 2017 Integrated TiN coated porous silicon supercapacitor with large capacitance per foot print
Kestutis Grigoras, Leif Grönberg, Jouni Ahopelto, Mika Prunnila
Author Affiliations +
Proceedings Volume 10246, Smart Sensors, Actuators, and MEMS VIII; 102460Z (2017) https://doi.org/10.1117/12.2266603
Event: SPIE Microtechnologies, 2017, Barcelona, Spain
Abstract
We have fabricated a micro-supercapacitor with porous silicon electrodes coated with TiN by atomic layer deposition technique. The coating provides an efficient surface passivation and high electrical conductivity of the electrodes, resulting in stable and almost ideal electrochemical double layer capacitor behavior with characteristics comparable to the best carbon based micro-supercapacitors. Stability of the supercapacitor is verified by performing 50 000 voltammetry cycles with high capacitance retention obtained. Silicon microfabrication techniques facilitate integration of both supercapacitor electrodes inside the silicon substrate and, in this work, such in-chip supercapacitor is demonstrated. This approach allows realization of very high capacitance per foot print area. The in-chip micro-supercapacitor can be integrated with energy harvesting elements and can be used in wearable and implantable microdevices.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kestutis Grigoras, Leif Grönberg, Jouni Ahopelto, and Mika Prunnila "Integrated TiN coated porous silicon supercapacitor with large capacitance per foot print", Proc. SPIE 10246, Smart Sensors, Actuators, and MEMS VIII, 102460Z (30 May 2017); https://doi.org/10.1117/12.2266603
Lens.org Logo
CITATIONS
Cited by 1 patent.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Electrodes

Capacitance

Coating

Atomic layer deposition

Picosecond phenomena

Scanning electron microscopy

Back to Top