Amplification of femtosecond pulses at 126 nm in optical field-induced plasma filamentation in Ar

Shoichi Kubodera; Kazuyuki Fujiyoshi; Masanori Kaku; Masahito Katto

doi:10.1117/12.2256014

13 January 2017 Amplification of femtosecond pulses at 126 nm in optical field-induced plasma filamentation in Ar

Shoichi Kubodera, Kazuyuki Fujiyoshi, Masanori Kaku, Masahito Katto

Proceedings Volume 10254, XXI International Symposium on High Power Laser Systems and Applications 2016; 1025414 (2017) https://doi.org/10.1117/12.2256014
Event: XXI International Symposium on High Power Laser Systems and Applications, 2016, Gmunden, Austria

Abstract

We have observed an optical gain at the wavelength of 126 nm in an Ar excimer (Ar₂ ^*) amplifier by utilizing a femtosecond vacuum ultraviolet (VUV) seed beam tuned at 126 nm. The maximum optical gain value of 1.1 cm^-1 with a spatial distribution in the optical-field-induced ionization (OFI) Ar plasma was observed. The plasma diagnosis revealed that the plasma contraction near the plasma amplifier axis together with the plasma expansion was a key issue to observe such a high optical gain value inside the Ar plasma filament. The center axis of the contracted plasma amplifier showed the high electron density more than 10¹⁸cm^-3even after 100 ns from the plasma production of Ar at 1 MPa. Our OFI plasma/excimer kinetics code reproduced the temporal progress of the optical gain distribution as well as the maximum gain value.

Citation Download Citation

Shoichi Kubodera, Kazuyuki Fujiyoshi, Masanori Kaku, and Masahito Katto "Amplification of femtosecond pulses at 126 nm in optical field-induced plasma filamentation in Ar", Proc. SPIE 10254, XXI International Symposium on High Power Laser Systems and Applications 2016, 1025414 (13 January 2017); https://doi.org/10.1117/12.2256014

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