LPP-EUV light source for HVM lithography

T. Saito; Y. Ueno; T. Yabu; A. Kurosawa; S. Nagai; T. Yanagida; T. Hori; Y. Kawasuji; T. Abe; T. Kodama; H. Nakarai; T. Yamazaki; H. Mizoguchi

doi:10.1117/12.2257464

13 January 2017 LPP-EUV light source for HVM lithography

T. Saito, Y. Ueno, T. Yabu, A. Kurosawa, S. Nagai, T. Yanagida, T. Hori, Y. Kawasuji, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, H. Mizoguchi

Author Affiliations +

Proceedings Volume 10254, XXI International Symposium on High Power Laser Systems and Applications 2016; 102541A (2017) https://doi.org/10.1117/12.2257464
Event: XXI International Symposium on High Power Laser Systems and Applications, 2016, Gmunden, Austria

Abstract

We have been developing a laser produced plasma extremely ultra violet (LPP-EUV) light source for a high volume manufacturing (HVM) semiconductor lithography. It has several unique technologies such as the high power short pulse carbon dioxide (CO2) laser, the short wavelength solid-state pre-pulse laser and the debris mitigation technology with the magnetic field. This paper presents the key technologies for a high power LPP-EUV light source. We also show the latest performance data which is 188W EUV power at intermediate focus (IF) point with 3.7% conversion efficiency (CE) at 100 kHz.

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T. Saito, Y. Ueno, T. Yabu, A. Kurosawa, S. Nagai, T. Yanagida, T. Hori, Y. Kawasuji, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi "LPP-EUV light source for HVM lithography", Proc. SPIE 10254, XXI International Symposium on High Power Laser Systems and Applications 2016, 102541A (13 January 2017); https://doi.org/10.1117/12.2257464

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