A New Kinoform Manufacturing Process

Hans Andersson; Mats Ekberg; Sverker Hard; Stellan Jacobsson; Michael Larsson; Tomas Nilsson

doi:10.1117/12.950228

31 March 1989 A New Kinoform Manufacturing Process

Hans Andersson, Mats Ekberg, Sverker Hard, Stellan Jacobsson, Michael Larsson, Tomas Nilsson

Proceedings Volume 1026, Holography Techniques and Applications; (1989) https://doi.org/10.1117/12.950228
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Kinoforms were manufactured by transferring computer-calculated phase-data into a photo-resist layer applied to a glass substrate. This transfer was carried out with conventional photolithographic techniques, using one single photomask exposed in discrete grey scale levels. The photomasks were generated in a specially designed PC controlled exposure system. We present kinoforms manufactured in ten levels with a pixel width of 20 μm. About SO% of the totally transmitted power was diffracted into the desired intensity distribution, and a few percent were undeflected at λ = 632.8 nm.

Citation Download Citation

Hans Andersson, Mats Ekberg, Sverker Hard, Stellan Jacobsson, Michael Larsson, and Tomas Nilsson "A New Kinoform Manufacturing Process", Proc. SPIE 1026, Holography Techniques and Applications, (31 March 1989); https://doi.org/10.1117/12.950228

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