Diffractive optics fabricated by electron-beam direct write methods

D. Zaleta; Walter Daeschner; J. Michael Larsson; Bernard C. Kress; Jiao Fan; Kristopher S. Urquhart; Sing H. Lee

doi:10.1117/12.170196

28 December 1993 Diffractive optics fabricated by electron-beam direct write methods

D. Zaleta, Walter Daeschner, J. Michael Larsson, Bernard C. Kress, Jiao Fan, Kristopher S. Urquhart, Sing H. Lee

Proceedings Volume 10271, Diffractive and Miniaturized Optics: A Critical Review; 1027108 (1993) https://doi.org/10.1117/12.170196
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Due to the stringent requirements on the lateral alignment and the large number of steps required to fabricate diffractive optics by typical microlithographic techniques, the need for more efficient methods to fabricate these elements has arisen. This paper discusses the use of electron beam lithography in fabricating diffractive optical elements by direct e-beam alignment and direct write into the electron beam resist. Many of the practical advantages and disadvantages of each method will be pointed out. In particular, current research and future research directions into such direct write problems as the proximity effect, hologram ruggedness, and lengthy exposure times will be addressed.

Citation Download Citation

D. Zaleta, Walter Daeschner, J. Michael Larsson, Bernard C. Kress, Jiao Fan, Kristopher S. Urquhart, and Sing H. Lee "Diffractive optics fabricated by electron-beam direct write methods", Proc. SPIE 10271, Diffractive and Miniaturized Optics: A Critical Review, 1027108 (28 December 1993); https://doi.org/10.1117/12.170196

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