Lithography equipment: what is out there and what is coming

Harry J. Levinson

doi:10.1117/12.2284075

30 August 2017 Lithography equipment: what is out there and what is coming

Harry J. Levinson

Proceedings Volume 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition; 1032002 (2017) https://doi.org/10.1117/12.2284075
Event: Tutorial Texts in Optical Engineering Series 1991, 1991, Bellingham, WA, United States

Abstract

Lithography equipment is undergoing some of the most significant changes since the introduction of the wafer stepper. The driving force behind these changes is the diffraction limit of optics. The resulting characteristics of new lithography equipment, to contend with the diffraction limit, are discussed. The high cost of lithography equipment has made mix-and-match lithography commonplace. Step-and-scan technology is the wave of the near-future, as a way to contend with the difficulty of manufacturing wide-field lenses. Resist processing equipment will undergoing few changes, but will often be integrated with steppers. Metrology is being stretched to its limits for technologies below 250 nm.

Citation Download Citation

Harry J. Levinson "Lithography equipment: what is out there and what is coming", Proc. SPIE 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition, 1032002 (30 August 2017); https://doi.org/10.1117/12.2284075

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