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31 August 2017 High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography
Shinya Nakajima, Satoshi Takei, Makoto Hanabata, Naoto Sugino, Takao Kameda, Yoko Matsumoto, Atsushi Sekiguchi
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Proceedings Volume 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV; 103541B (2017) https://doi.org/10.1117/12.2273270
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States
Abstract
A cellulose-based gas permeable mold having thermal crosslinking group for nanoimprint lithography has been developed to prevent transcriptional defects by volatile solvents from nanoimprinting materials. 3 wt.% of thermal initiator was required for producing the cellulose-based gas permeable mold. The void on 10 μm line structure of imprinted UV crosslinked resin with acetone as volatile solvents in nanoimprint lithography process using non-gas permeable mold was significantly removed using the cellulose-based gas permeable mold due to its high oxygen gas permeability. The cellulosebased gas permeable mold allows the employment of solvent including imprinting materials such as compounds and alloy particle.
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Shinya Nakajima, Satoshi Takei, Makoto Hanabata, Naoto Sugino, Takao Kameda, Yoko Matsumoto, and Atsushi Sekiguchi "High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography", Proc. SPIE 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV, 103541B (31 August 2017); https://doi.org/10.1117/12.2273270
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KEYWORDS
Nanoimprint lithography
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