New generation all-silica based optical elements for high power laser systems

T. Tolenis; L. Grinevičiūtė; A. Melninkaitis; A. Selskis; R. Buzelis; L. Mažulė; R. Drazdys

doi:10.1117/12.2272952

30 August 2017 New generation all-silica based optical elements for high power laser systems

T. Tolenis, L. Grinevičiūtė, A. Melninkaitis, A. Selskis, R. Buzelis, L. Mažulė, R. Drazdys

Proceedings Volume 10356, Nanostructured Thin Films X; 103560J (2017) https://doi.org/10.1117/12.2272952
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States

Abstract

Laser resistance of optical elements is one of the major topics in photonics. Various routes have been taken to improve optical coatings, including, but not limited by, materials engineering and optimisation of electric field distribution in multilayers. During the decades of research, it was found, that high band-gap materials, such as silica, are highly resistant to laser light. Unfortunately, only the production of anti-reflection coatings of all-silica materials are presented to this day. A novel route will be presented in materials engineering, capable to manufacture high reflection optical elements using only SiO₂ material and GLancing Angle Deposition (GLAD) method. The technique involves the deposition of columnar structure and tailoring the refractive index of silica material throughout the coating thickness. A numerous analysis indicate the superior properties of GLAD coatings when compared with standard methods for Bragg mirrors production. Several groups of optical components are presented including anti-reflection coatings and Bragg mirrors. Structural and optical characterisation of the method have been performed and compared with standard methods. All researches indicate the possibility of new generation coatings for high power laser systems.

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T. Tolenis, L. Grinevičiūtė, A. Melninkaitis, A. Selskis, R. Buzelis, L. Mažulė, and R. Drazdys "New generation all-silica based optical elements for high power laser systems", Proc. SPIE 10356, Nanostructured Thin Films X, 103560J (30 August 2017); https://doi.org/10.1117/12.2272952

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