Lithography lens mounting flexure number design and aberration analysis

Ming-Ying Hsu; Shenq-Tsong Chang; Ting-Ming Huang

doi:10.1117/12.2272104

23 August 2017 Lithography lens mounting flexure number design and aberration analysis

Ming-Ying Hsu, Shenq-Tsong Chang, Ting-Ming Huang

Proceedings Volume 10371, Optomechanical Engineering 2017; 103710F (2017) https://doi.org/10.1117/12.2272104
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

The refraction lithography lens has many units, which are easily deformed by gravity forces. However, the lens mount flexure design can relieve lens surface gravity deformation. The lithography lens generically has more than 10 lens units, so with each unit, the gravity deformation sum will create large aberrations in the system. The flexure number can generate a relative aberration, such as trefoil, tetrafoil, and high-order aberrations. In addition, the lens flexure orientation can compensate for non-symmetric to symmetric aberrations from effects of gravity deformation. Thus, symmetric aberrations must resist magnitude in one or two lens units through the measurement data. This study attempts to calculate and predict lens gravity deformation; the results can assist with optical design and reoptimize system performance, as well as reduce the rework risk by measurement data.

Conference Presentation

Citation Download Citation

Ming-Ying Hsu, Shenq-Tsong Chang, and Ting-Ming Huang "Lithography lens mounting flexure number design and aberration analysis", Proc. SPIE 10371, Optomechanical Engineering 2017, 103710F (23 August 2017); https://doi.org/10.1117/12.2272104

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