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21 September 2017 Predicting silicon pore optics
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Continuing improvement of Silicon Pore Optics (SPO) calls for regular extension and validation of the tools used to model and predict their X-ray performance. In this paper we present an updated geometrical model for the SPO optics and describe how we make use of the surface metrology collected during each of the SPO manufacturing runs. The new geometrical model affords the user a finer degree of control on the mechanical details of the SPO stacks, while a standard interface has been developed to make use of any type of metrology that can return changes in the local surface normal of the reflecting surfaces. Comparisons between the predicted and actual performance of samples optics will be shown and discussed.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Giuseppe Vacanti, Nicolas Barriére, Marcos Bavdaz, Abdelhakim Chatbi, Maximilien Collon, Danielle Dekker, David Girou, Ramses Günther, Roy van der Hoeven, Boris Landgraf, Jessica Sforzini, Mark Vervest, and Eric Wille "Predicting silicon pore optics", Proc. SPIE 10399, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII, 103990M (21 September 2017);


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