Andrew J. Hohne,1 Benjamin Moon,1 Carol L. Baumbauer,1 Tristan Gray,1 James Dilts,1 Joseph A Shawhttps://orcid.org/0000-0003-1056-1269,1 David L. Dickensheets,1 Wataru Nakagawa1
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We present the design, fabrication, and characterization of a polarization-selective infrared bandpass filter based on a two-layer subwavelength metallic grating for use in polarimetric imaging. Gold nanowires were deposited via physical vapor deposition (PVD) onto a silicon surface relief grating that was patterned using electron beam lithography (EBL) and fabricated using standard silicon processing techniques. Optical characterization with a broad-spectrum tungsten halogen light source and a grating spectrometer showed normalized peak TM transmission of 53% with a full-width at half-maximum (FWHM) of 122 nm, which was consistent with rigorous coupled-wave analysis (RCWA) simulations. Simulation results suggested that device operation relied on suppression of the TM transmission caused by surface plasmon polariton (SPP) excitation at the gold-silicon interface and an increase in TM transmission caused by a Fabry-Perot (FP) resonance in the cavity between the gratings. TE rejection occurred at the initial air/gold interface. We also present simulation results of an improved design based on a two-dielectric grating where two different SPP resonances allowed us to improve the shape of the passband by suppressing the side lobes. This newer design resulted in improved side-band performance and increased peak TM transmission.
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Andrew J. Hohne, Benjamin Moon, Carol L. Baumbauer, Tristan Gray, James Dilts, Joseph A Shaw, David L. Dickensheets, Wataru Nakagawa, "Polarization-selective infrared bandpass filter based on a two-layer subwavelength metallic grating," Proc. SPIE 10407, Polarization Science and Remote Sensing VIII, 104070H (30 August 2017); https://doi.org/10.1117/12.2273065