Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants

Li-Jen Hsiao; Hoang-Yan Lin

doi:10.1117/12.2280448

16 October 2017 Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants

Li-Jen Hsiao, Hoang-Yan Lin

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Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 1045021 (2017) https://doi.org/10.1117/12.2280448
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Since the conception of the Generalized Gaussian Constants, and its foundation the Gaussian Bracket, is a powerful tool in analyzing complex optical systems, though up until now it has seen use almost exclusive in designing zoom lens systems. This study investigates the correspondence of Generalized Gaussian Constants to optical system properties, and demonstrates a design method in particular for the reflective projection system in EUV lithography. The detailed four-mirror design is a proof of concept of the design method, and a more complex eight-mirror design demonstrates the capacity for higher design complexity.

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Li-Jen Hsiao and Hoang-Yan Lin "Extreme ultra violet lithographic optical projection system design method using Code V lens module and generalized Gaussian constants", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 1045021 (16 October 2017); https://doi.org/10.1117/12.2280448

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KEYWORDS

Mirrors

Code v

Lithography

Optical design

Optical properties

Projection systems

Extreme ultraviolet lithography

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