Paper
24 October 2017 Characterization of the contribution of CGH fabrication error to measurement uncertainty in null test
Author Affiliations +
Proceedings Volume 10460, AOPC 2017: Optoelectronics and Micro/Nano-Optics; 104601O (2017) https://doi.org/10.1117/12.2285550
Event: Applied Optics and Photonics China (AOPC2017), 2017, Beijing, China
Abstract
Aspheric surface acts an important role in modern optical systems. The null test utilizing a computergenerated hologram (CGH) is fundamental for precision test of aspheres. Its measurement accuracy mainly depends on the fabrication precision of CGH. However, it is not easy to exactly characterize the fabrication error of the CGH as well as its contribution to measurement uncertainty. In this paper, a new CGH wavefront error evaluation method is presented. The CGH fabrication errors such as duty-cycle error, etching depth inhomogeneity, pattern distortion, etc., are related to the fringe spacing based on elaborate measurement of the CGH microstructures. A scanning white-light interferometer and a high-precision two-axis stage are employed to sample the microstructure at a series of designed locations on the CGH. When the fabrication error is modeled through experiments, it can then help to realize rapid measurement of any other CGHs with significantly reduced number of sampling. The second step is then modeling the contribution of CGH fabrication error to measurement uncertainty according to the scalar diffraction theory. Meanwhile, the wavefront error induced by CGH fabrication error can also be characterized through ray-tracing in lens design software. The fabrication error is incorporated into the discrete phase data of CGH surface and its contribution to the final measurement uncertainty is evaluated through simulations.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lin Hao, Shanyong Chen, and Shuai Xue "Characterization of the contribution of CGH fabrication error to measurement uncertainty in null test", Proc. SPIE 10460, AOPC 2017: Optoelectronics and Micro/Nano-Optics, 104601O (24 October 2017); https://doi.org/10.1117/12.2285550
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Computer generated holography

Wavefronts

Error analysis

Back to Top