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6 May 1989 Electron Beam Writing Of Binary And Optical Writing Of Blazed Diffractive Optical Elements
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We have developed an opto-mechanical technique for the direct writing of blazed surface relief diffractive elements (kinoforms) in photoresist. An important feature of the technique is that the circular zones or rulings which are written one zone at a time, can be of any width and radius with a profile tuned to give optimum response at any required wavelength in the visible and IR. Standard zone plates, diffractive linear axicons, ring focus elements and compound elements have been made and their performance evaluated. By using the electron beam lithographic facilities at Rutherford Laboratory, binary amplitude zone plates with polygon rather that circular zones have been made in chrome on glass substrates. These have subsequently been copied into photoresist as binary phase zone plates to give a higher diffraction efficiency. Current work is concerned with the production of wavefront aberration compensating diffractive elements and with elements for optical testing.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robin W. Smith, Rodrigo G. Canas, and Andrew A. West "Electron Beam Writing Of Binary And Optical Writing Of Blazed Diffractive Optical Elements", Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989);

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