Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica

Kevin M. Flood; J. Michael Finlan; Richard J. Bojko

doi:10.1117/12.951491

6 May 1989 Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica

Kevin M. Flood, J. Michael Finlan, Richard J. Bojko

Proceedings Volume 1052, Holographic Optics: Optically and Computer Generated; (1989) https://doi.org/10.1117/12.951491
Event: OE/LASE '89, 1989, Los Angeles, CA, United States

Abstract

We present a new approach for fabricating multiple phase level holographic optical elements in fused silica. The approach utilizes electron-beam lithography, and it is particularly applicable for devices with minimum feature sizes below 1 μm. We have succeeded in fabricating arrays of multiple phase level optical elements with minimum features of 0.4 μm. We also report on the diffraction efficiencies of cylindrical f/1 lenses with 3 mm focal lengths. The results agree very well with the theoretical predictions. We also predict that an increase in diffraction efficiency of as much as 10 % can be realized from the outer portions of a holographic lens through better registration of the multiple layers.

Citation Download Citation

Kevin M. Flood, J. Michael Finlan, and Richard J. Bojko "Multiple Phase Level Computer-Generated Holograms Etched In Fused Silica", Proc. SPIE 1052, Holographic Optics: Optically and Computer Generated, (6 May 1989); https://doi.org/10.1117/12.951491

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