Paper
19 February 2018 Laser diodes using InAlGaAs multiple quantum wells intermixed to varying extent
Yousef Alahmadi, Patrick LiKam Wa
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Abstract
Bandgap-modified InAlGaAs/InP multi-quantum well lasers have been demonstrated using an impurity-free disordering technique. Varying degrees of disordering are achieved by rapidly annealing silicon nitride-capped samples at temperatures ranging from 730°C to 830°C for 20 s. The lasing wavelength shift resulting from the intermixing, ranges between 28.2 nm and 147.2 nm. As the annealing temperature is increased, the lasing threshold currents of the fabricated waveguide lasers increase from 25mA to 45mA, while the slope efficiency decrease from 0.101 W/A to 0.068 W/A, compared to a threshold current of 27.8 mA and a slope efficiency of 0.121 W/A for an as-grown laser diode.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yousef Alahmadi and Patrick LiKam Wa "Laser diodes using InAlGaAs multiple quantum wells intermixed to varying extent", Proc. SPIE 10553, Novel In-Plane Semiconductor Lasers XVII, 1055307 (19 February 2018); https://doi.org/10.1117/12.2311369
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KEYWORDS
Semiconductor lasers

Silica

Quantum wells

Annealing

Fabry–Perot interferometers

Reactive ion etching

Etching

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