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19 March 2018 The state of the art in multicolor visible photolithography
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Multicolor photolithography using visible light holds the promise of achieving wafer-scale patterning at pitches on the 10 nm scale. Although substantial progress has been made on multicolor techniques, a number of challenges remain to be met before the ultimate resolution of these methods can be reached. These challenges include the development of improved materials, creation of high-quality thin films, transitioning to exposure schemes that rely completely on linear absorption, scaling up to large-area patterning, and developing methods for effective pattern transfer. This paper discusses the state of the art in multicolor photolithography, presents some of the most recent advances in this field, and examines the prospects moving forward.
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Nikolaos Liaros, Zuleykhan Tomova, Sandra A. Gutierrez Razo, Samuel R. Cohen, John T. Fourkas, Steven M. Wolf, Matthew Thum, Daniel E. Falvey, Hannah M. Ogden, Amy S. Mullin, Adam Pranda, Gottlieb S. Oehrlein, and John S. Petersen "The state of the art in multicolor visible photolithography", Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058407 (19 March 2018);

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