Cutting edge multiple beam technology for EUV era: latest development progress and application

Eric Ma; Kevin Chou; Xuedong Liu; Weiming Ren; Xuerang Hu; Fei Wang; Kevin Liu

doi:10.1117/12.2323183

13 March 2018 Cutting edge multiple beam technology for EUV era: latest development progress and application

Eric Ma, Kevin Chou, Xuedong Liu, Weiming Ren, Xuerang Hu, Fei Wang, Kevin Liu

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 1058535 (2018) https://doi.org/10.1117/12.2323183
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

In this paper, we focus on our most advanced multiple beam technology and next generation multiple beam inspector(MBI) development. We have successfully got 9 images on primary beam module, proving our design concept is correct. We also discussed related technologies, e.g. Computation and fast stage technology to further improve throughput and lower COO. At last MBI new applications are discussed.

Citation Download Citation

Eric Ma, Kevin Chou, Xuedong Liu, Weiming Ren, Xuerang Hu, Fei Wang, and Kevin Liu "Cutting edge multiple beam technology for EUV era: latest development progress and application", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 1058535 (13 March 2018); https://doi.org/10.1117/12.2323183

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available