Enabling proximity mask-aligner lithography with a 193nm CW light source

Raoul Kirner; Andreas Vetter; Dmitrijs Opalevs; Matthias Scholz; Patrick Leisching; Toralf Scharf; Wilfried Noell; Carsten Rockstuhl; Reinhard Voelkel

doi:10.1117/12.2297171

20 March 2018 Enabling proximity mask-aligner lithography with a 193nm CW light source

Raoul Kirner, Andreas Vetter, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, Reinhard Voelkel

Author Affiliations +

Proceedings Volume 10587, Optical Microlithography XXXI; 105871F (2018) https://doi.org/10.1117/12.2297171
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-amplification configuration is frequency-quadrupled using lithiumtriborate and potassium-uoro-beryllo-borate non-linear crystals. The large coherence-length of this monomodal laser is controlled by static and rotating shaped random diffusers. Beam shaping with imaging and non-imaging homogenizers realized with diffractive and refractive micro-optical elements is compared in simulation and measurement. We demonstrate resolution patterns offering resolutions <2 µm printed with proximity gaps of 20 µm.

Citation Download Citation

Raoul Kirner, Andreas Vetter, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, and Reinhard Voelkel "Enabling proximity mask-aligner lithography with a 193nm CW light source", Proc. SPIE 10587, Optical Microlithography XXXI, 105871F (20 March 2018); https://doi.org/10.1117/12.2297171

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