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5 June 2018 Modeling and manufacture of an interference filter with a defective layer for narrow spectral selection
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We manufactured and investigated narrow spectral selection filter with a defect layer. Design of the filter was performed based on results of modeling. The main idea of that filter is sandwich structure of 5 layers with high aspect ratio between refractive indices of two different layers and phase diffractive optical element in the central layer. The structure was manufactured for operation at wavelength of 532 nm. The ZnO (n=2.03) and TiO2 (n=2.67) thin films were chosen as materials for the designed sandwich structure. The thin films were deposited by the magnetron sputtering system “Caroline D12A”. The thickness of each ZnO layer is 50 nm, the thickness of each TiO2 layer is 65 nm. The central defective layer was fabricated with the help of a plasma-chemical etching system through a hard mask of chromium. The chromium hard mask was manufactured by direct laser writing. The central TiO2 layer was etched in a SF6 gas. Then the mask was removed by liquid chemical etching. The influence of the multilayer structure properties and parameters of defective layer on the spectral characteristics of the optical filter was investigated. This filter shows very narrow spectrum selection and high efficiency. The possibility of the use of such filters for selecting a narrow range of wavelengths that can find various applications in the field of information transfer and medical devices was shown.
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Sergey A. Fomchenkov and Alexey P. Porfirev "Modeling and manufacture of an interference filter with a defective layer for narrow spectral selection", Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911Z (5 June 2018);

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