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19 September 2018 Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models
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Proceedings Volume 10775, 34th European Mask and Lithography Conference; 107750A (2018) https://doi.org/10.1117/12.2326106
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France
Abstract
In this paper the bias table models for the wafer scale SmartNIL™ technology are addressed and validated using complete Scanning Electron Microscopy (SEM) characterizations and polynomial interpolation functions. Like the other nanoimprint lithography (NIL) technics, this replication technology is known to induce Critical Dimension (CD) variations between the master and the imprint, due to polymer shrinkage, soft stamp deformation or thermal expansion. The bias between the former and final object follows peculiar rules which are specific to this process. To emphasis these singularities, Critical Dimension (CD) uniformity analyses were analyzed onto 200 mm wafers imprinted with the HERCULES® NIL equipment platform. Dedicated masters were manufactured to capture the process signatures: horizontal and vertical line arrays, local densities ranging from 0.1 to 0.9 and minimum CD of 250 nm. The silicon masters were manufactured with 248 optical lithography and dry etching and treated with an anti-sticking layer from Arkema. CD measurements were made for the master and the replicates on 48 well selected features to build interpolations. The bias table, modelled by polynomial functions with a degree of 5 for the density and a degree of 3 for the CD, are compared between horizontal and vertical features, and between the center and the edge of the wafers. Finally the focus is made on the validation of the interpolations by comparing the computed bias and the experimental data.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Teyssedre, P. Quemere, J. Chartoire, F. Delachat, F. Boudaa, L. Perraud, and M. May "Application of rules-based corrections for wafer scale nanoimprint processes and evaluation of predictive models ", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750A (19 September 2018); https://doi.org/10.1117/12.2326106
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