Paper
19 September 2018 Plasmonic resonances in metal covered 2D hexagonal gratings fabricated by interference lithography
Andrei A. Ushkov, Maxime Bichotte, Isabelle Verrier, Thomas Kampfe, Yves Jourlin
Author Affiliations +
Proceedings Volume 10775, 34th European Mask and Lithography Conference; 1077516 (2018) https://doi.org/10.1117/12.2323763
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France
Abstract
We present both modeling and experimental results devoted to design, fabrication and characterization of metal covered hexagonal diffraction gratings. Variation of exposition and development time allow to modify the shape of the elementary cell, leaving the depth and periodicity unchanged. The fabrication process was modeled using real parameters of the lithography bench and the photoresist, substantially improving experimental results. The high quality of metal covered gratings is confirmed by excitation of plasmonic resonances, which are in a good agreement with theoretical predictions. The described approach allows to better understand plasmonic effects in 2D periodic structures and leads to an optimized design of plasmonic sensors.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrei A. Ushkov, Maxime Bichotte, Isabelle Verrier, Thomas Kampfe, and Yves Jourlin "Plasmonic resonances in metal covered 2D hexagonal gratings fabricated by interference lithography", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 1077516 (19 September 2018); https://doi.org/10.1117/12.2323763
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KEYWORDS
Photoresist materials

Lithography

Plasmonics

Photoresist developing

Metals

Diffraction gratings

Plasmons

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