Development of closed-type EUV pellicle

Yosuke Ono; Kazuo Kohmura; Atsushi Okubo; Daiki Taneichi; Hisako Ishikawa; Tsuneaki Biyajima

doi:10.1117/12.2324819

12 June 2018 Development of closed-type EUV pellicle

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, Daiki Taneichi, Hisako Ishikawa, Tsuneaki Biyajima

Proceedings Volume 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology; 108070I (2018) https://doi.org/10.1117/12.2324819
Event: Photomask Japan 2018, 2018, Yokohama, Japan

Abstract

In this study, we fabricated a closed type EUV pellicle without any gaps by using the mask adhesive, forming the vent holes in the Si border part and putting the sufficiently wide area filters on the top side of Si border. Ventilation performance of closed EUV pellicle was examined during pumping and ventilation condition. As the result, we found that the closed EUV pellicle has enough ventilation performance under the practical pumping down condition. Furthermore, as for EUV pellicle, contamination growth on mask surface during EUV exposure should be suppressed. We fabricated EUV pellicle with coated adhesive as the mask adhesive to suppress the outgas generation which causes the contamination on mask during EUV exposure. EUV irradiation was performed to the base plate which has similar component of the EUV mask surface inside the pellicle space. Contamination growth was not observed for the sample with coated adhesive, but observed for the sample with general adhesive as mask adhesive. Coated adhesives for mask adhesive of EUV pellicle, which keep the adhesive properties, will be suitable for fixing method to suppress the mask contamination during EUV exposure.

Citation Download Citation

Yosuke Ono, Kazuo Kohmura, Atsushi Okubo, Daiki Taneichi, Hisako Ishikawa, and Tsuneaki Biyajima "Development of closed-type EUV pellicle", Proc. SPIE 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 108070I (12 June 2018); https://doi.org/10.1117/12.2324819

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available