Optical studies of nanocrystalline and amorphous TiO2 thin films deposited by HiTUS technique

Ihor Studenyak; Olexander Nahusko; Vitalii Izai; Mladen Kranjčec; Peter Kúš; Marian Mikula; Kanat Mussabekov; Andrzej Kociubiński

doi:10.1117/12.2501508

1 October 2018 Optical studies of nanocrystalline and amorphous TiO₂ thin films deposited by HiTUS technique

Ihor Studenyak, Olexander Nahusko, Vitalii Izai, Mladen Kranjčec, Peter Kúš, Marian Mikula, Kanat Mussabekov, Andrzej Kociubiński

Author Affiliations +

Proceedings Volume 10808, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018; 108084W (2018) https://doi.org/10.1117/12.2501508
Event: Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018, 2018, Wilga, Poland

Abstract

TiO₂ thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique. Structural studies of TiO₂ thin films of different thickness were performed by X-ray diffraction. Refractive index and extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO₂ thin films were investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO₂ thin film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO₂ thin films was analysed.

Citation Download Citation

Ihor Studenyak, Olexander Nahusko, Vitalii Izai, Mladen Kranjčec, Peter Kúš, Marian Mikula, Kanat Mussabekov, and Andrzej Kociubiński "Optical studies of nanocrystalline and amorphous TiO₂ thin films deposited by HiTUS technique", Proc. SPIE 10808, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2018, 108084W (1 October 2018); https://doi.org/10.1117/12.2501508

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