Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura; Tsukasa Hori; Takayuki Yabu; Katsuhiko Wakana; Yoshifumi Ueno; Georg Soumagne; Shinji Nagai; Tatsuya Yanagida; Yasufumi Kawasuji; Yutaka Shiraishi; Tamotsu Abe; Hiroaki Nakarai; Takashi Saito; Hakaru Mizoguchi

doi:10.1117/12.2500356

3 October 2018 Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108091M (2018) https://doi.org/10.1117/12.2500356
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

Gigaphoton Inc. has been developing a CO₂-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO₂) laser with 15 ns pulse duration, a short wavelength solid-state pre-pulse laser with 10 ps pulse duration, a highly stabilized small droplet (DL) target, a precise DL-laser shooting control system and unique debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.

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Yuichi Nishimura, Tsukasa Hori, Takayuki Yabu, Katsuhiko Wakana, Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Tatsuya Yanagida, Yasufumi Kawasuji, Yutaka Shiraishi, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito, and Hakaru Mizoguchi "Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091M (3 October 2018); https://doi.org/10.1117/12.2500356

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