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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Photomask Technology 2018, edited by Emily E. Gallagher, Jed H. Rankin, Proceedings of SPIE Vol. 10810 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510622159 ISBN: 9781510622166 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2018, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/18/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Aghili, Ali, 0F Alty, Hayden R., 0N, 11 Asano, Toshiya, 0F Ausschnitt, Kit, 0T Badger, Karen, 08 Bayle, S., 1D Bork, Ingo, 0M Bowhill, Amanda, 0L Buck, Peter, 0L, 0M Bürgel, Christian, 1G, 1H Büttner, Rico, 1G Calderón, Daniel, 05 Chao, Chih Hsuan, 1K Chartoire, J., 1D Chaudhary, Narendra, 1L Chen, Ming, 1B Chen, Sweet, 1K Cheng, Jackie, 1K Cheng, James, 1K Cheng, Jeffrey, 1K Cho, Wonil, 17 Choi, Jin, 0F Choi, Yohan, 1K Choo, Min, 17 Chou, Hsin Fu, 1K Chou, Kevin, 14 Chou, William, 1K Chua, Gek-Soon, 1H Chung, Paul, 17 Cong, Linna, 0Z Dahl, Victoria, 0R Dai, Yaoxuan, 1E Dattilo, Davide, 0R DeRose, Guy A., 0N Detavernier, Christophe, 0C D’Have, Koen, 0T Dietze, Sebastian, 0R Dietze, Uwe, 0R Donga, T., 0B Durvasula, Bhardwaj, 0L, 0M Eilert, André, 1G Ekinci, Yasin, 0W, 0Y Erdmann, Andreas, 0C Evanschitzky, Peter, 0C Fay, A., 1D Fernandez, Sara, 0Y Finken, Michael, 1G Fowler, Trevor, 0N Fujimura, Aki, 02 Gallagher, Emily, 0Y Gao, Pengzheng, 1E Garvey, Terence, 0W Gilgenkrantz, Pascal, 0L Girodon, A., 1D Gladhill, Richard, 0Q Green, Michael, 1K Ham, Young, 1K Hamaji, Masakazu, 1H Hamaya, Zenichi, 0F Han, Zhenxing, 0R Hashimoto, M., 0O Hazart, J., 1D Heidarnia-Fathabad, Zahra, 0C Helfenstein, Patrick, 0Y Hellriegel, Ronald, 1G Hendrickx, Eric, 0C Herrmann, Mark, 1G Heumann, Jan, 08 Hoshino, M., 0O Hu, Xuerang, 14 Hübenthal, Frank, 1G Hunt, Matthew S., 0N Hur, JiUk, 17 Inderhees, Gregg, 17 Isogawa, Takeshi, 08 Ito, Y., 0B Iwasa, Junji, 0E Jang, IlYong, 17 Jeon, Chan-Uk, 17 Jiang, Wei, 1B Jones, Chris, 0F Kagawa, Masayuki, 08 Kageyama, Kagehiro, 1J Kalsbeck, Bill, 17 Kang, In-Yong, 17 Kazazis, Dimitrios, 0Y Kim, Stephen, 0L Kotera, M., 0B Kozawa, T., 0O Kwon, Eric, 17 Latinwo, Folarin, 1A Laubis, Christian, 0C LeClaire, Jeff, 09 Lee, Adder, 1K Lee, Hong Jen, 1K Lee, Sang Kook, 0N Leray, Philippe, 0T Lewis, Scott M., 0N Lewis, Scott M., 11 Li, Alan, 0Z, 1B Li, Jarvis, 0N Ling, Wenjun, 0Z Liu, Xuedong, 14 Löffler, Oliver, 1G Lu, Colbert, 1K Lu, Max, 1B Lucas, Kevin, 1A Luong, Kim Vu, 0C Ma, Eric, 14 Mariano Juste, Marina, 0Y Mizuno, Makoto, 0F Mochi, Iacopo, 0Y Mochizuki, Satoru, 1J Morimoto, K., 0B Morosawa, Narihiro, 1J Muryn, Christopher A., 0N Nakagawa, Kent H., 0Q Nakajima, A., 0O Nestler, Rico, 1G Noguchi, Yasunori, 1J Opsomer, Karl, 0C Palma, Diego, 05 Park, Minyoung, 0L Philipsen, Vicky, 0C Pollentier, Ivan, 0Y Progler, Chris, 1K Qin, Xuefei, 0Z Rajagopalan, Archana, 0L, 0M Rajeev, Rajendran, 0Y Ramadan, Mohamed, 1K Rao, Nageswara, 0L, 0M Reddy, Murali, 0M Ren, Weiming, 14 Resnick, Douglas J., 0E Rivkin, Leonid, 0W Robinson, Tod, 09 Sakai, Keita, 0F Samayoa, Martin, 0R Sato, Yutaro, 1H Savari, Serap A., 1L Scherer, Axel, 0N Schiavone, P., 1D Scholze, Frank, 0C Schulze, Steffen, 0L, 0M Seki, Junichi, 0F Seo, JeongHun, 17 Shen, Jian, 1B Shi, Irene, 0Z, 1B Shiely, J. P., 04 Son, Suein, 17 Song, Hua, 1A Steidel, Katja, 1G Streun, Andreas, 0W Su, Xiaojing, 1E Tan, Alexander, 17 Tian, Eric, 1B Timco, Grigore A., 0N Timmermans, Marina, 0Y Toda, Yusuke, 08 Torigoe, Yohei, 1H Truffert, Vincent, 0T Tsunoda, Dai, 1H Twu, C. H., 1K Tzeng, Josh, 1K van de Kruijs, Robbert W. E., 0C Wang, Fei, 14 Wang, Jie, 0Z Wang, Yanrong, 1E Wei, Yayi, 1E Werthiem, Alex, 0N Willis, Jan, 02 Winpenny, Richard E. P., 0N, 11 Wrulich, Albin, 0W Wu, Rich, 1A Xu, Fei, 1B Xue, Fen, 0Z, 1B Yan, Jiang, 1E Yang, Delian, 1A Yeates, Stephen G., 0N, 11 Yeddulapalli, S. S., 1L Yonetani, Masashi, 08 Zhang, Jing, 1E Conference CommitteeConference Chair Conference Co-chair BACUS Steering Committee
Conference Program Committee
Session Chairs
IntroductionThe 2018 SPIE Photomask Technology conference was held 17–19 September, in Monterey, California, co-located for the second time with the EUV Lithography conference. The organizers of the two conferences worked to blend the complementary interests of the two communities to craft a technical program that increased the range of topics while preserving long-held conference traditions. This year’s combined conference drew even more attendees than in 2017 and will continue as a joint event next year. The photomask can be seen either as an enabler or as the limiter of lithography and, by extension, the semiconductor industry roadmap. Papers at the conference reflected both roles. There were traditional mask-making topics and forward-looking studies. Examples of the latter included: the application of deep learning to CDSEM image analysis, future mask absorber materials, and designs for future photoresists. New this year was the speed poster talk session, enabling poster authors to introduce their posters in brief talks to the conference attendees before the poster session. This gave the posters more visibility, while preserving the in-depth discussions that are possible during the poster session. The yearly panel discussion topic reflected the long, slow industry shift towards EUV: “Optical and EUV Masks: Analyzing the HVM Requirements and Capability Differences”. It also acknowledges a fact discussed in the 2018 Mask Maker’s Survey: fewer than 0.5% of all masks delivered in 2018 were EUV and the industry is still digesting what moving to HVM EUV manufacturing really looks like. While this introduction gives you a sense for the conference, the proceeding papers will be more specifically instructive. Emily E. Gallagher Jed H. Rankin |
