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31 October 2018 Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)
Christoph Spengler, Elmar Platzgummer, Hans Loeschner
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Proceedings Volume 10810, Photomask Technology 2018; 108100I (2018) https://doi.org/10.1117/12.2503330
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States
Abstract
This conference presentation, originally published on 10 October 2018, was withdrawn per author request.
Spengler, Platzgummer, and Loeschner: Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Christoph Spengler, Elmar Platzgummer, and Hans Loeschner "Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 10810, Photomask Technology 2018, 108100I (31 October 2018); https://doi.org/10.1117/12.2503330
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KEYWORDS
Nanofabrication
Photomask technology
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