Photomask manufacturability and pattern fidelity for curvilinear structures

Richard Gladhill; Kent H. Nakagawa

doi:10.1117/12.2502055

3 October 2018 Photomask manufacturability and pattern fidelity for curvilinear structures

Richard Gladhill, Kent H. Nakagawa

Author Affiliations +

Proceedings Volume 10810, Photomask Technology 2018; 108100Q (2018) https://doi.org/10.1117/12.2502055
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

Microfabrication techniques, used widely for the construction of integrated circuits, are being used in an increasing variety of non-IC applications requiring features with curved shapes, such as the construction of photonics and microelectromechanical devices. Maintaining the fidelity of curved edges through the photomask fabrication process with tools originally designed to generate shapes with straight edges presents maskmakers with challenging issues of manufacturability and pattern fidelity. This paper will present and discuss various issues on the topic of photomask manufacturability for curvilinear structures; with recommendations for the design and layout of these structures to support photomask manufacturability while maintaining pattern fidelity.

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Citation Download Citation

Richard Gladhill and Kent H. Nakagawa "Photomask manufacturability and pattern fidelity for curvilinear structures", Proc. SPIE 10810, Photomask Technology 2018, 108100Q (3 October 2018); https://doi.org/10.1117/12.2502055

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