A study of the TMAH based clean performance on advanced photomask

Fen Xue; Irene Shi; Alan Li; Eric Tian; Ming Chen; Max Lu; Fei Xu; Wei Jiang; Jian Shen

doi:10.1117/12.2500804

3 October 2018 A study of the TMAH based clean performance on advanced photomask

Fen Xue, Irene Shi, Alan Li, Eric Tian, Ming Chen, Max Lu, Fei Xu, Wei Jiang, Jian Shen

Author Affiliations +

Proceedings Volume 10810, Photomask Technology 2018; 108101B (2018) https://doi.org/10.1117/12.2500804
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

As semiconductor devices become extremely integrated and their geometry continues to shrink, even slight critical dimension (CD) move or phase decay during photomask cleaning may have a negative impact on the CD uniformity performance of photomask. In addition, the printing of sub-resolution assist-features (SRAF) on photomask becomes the main limiting factor in using high power and low frequency Mega-sonic cleaning process, therefore, the balance between SRAF damage and clean performance becomes extremely important. In this research, the CD movement both on Chrome layer and MoSi layer and the phase and transmission decay on MoSi layer of advanced PSM photomask induced by Tetra-Methyl-Ammonium-Hydroxide (TMAH) based cleaning process were studied. Meanwhile, the difference between TMAH and SC1 were emphasized. The results showed that TMAH has significant advantage in CD move and phase decay. We also researched the SRAF damage condition after cleaning by the chemical of TMAH with Multi-Beam and Multi-Frequency (MBMF) mode. In addition, we collected different kinds of particles to study the particle remove capability of TMAH under MBMF mode.

Citation Download Citation

Fen Xue, Irene Shi, Alan Li, Eric Tian, Ming Chen, Max Lu, Fei Xu, Wei Jiang, and Jian Shen "A study of the TMAH based clean performance on advanced photomask", Proc. SPIE 10810, Photomask Technology 2018, 108101B (3 October 2018); https://doi.org/10.1117/12.2500804

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE