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3 October 2018 Recent bottom layered half-tone mask blanks development for large sized and high resolution flat panel displays
Narihiro Morosawa, Yasunori Noguchi, Satoru Mochizuki, Kagehiro Kageyama
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Proceedings Volume 10810, Photomask Technology 2018; 108101J (2018) https://doi.org/10.1117/12.2501511
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States
Abstract
Half-tone masks are essential for process reduction and shape control of photo reactive organic material in FPD, the importance of half-tone masks is increasing in recent large sized and high resolution displays. Half-tone masks are categorized as top layer type and bottom layer type. Process reduction and short term mask production are possible in bottom layer half-tone mask. Therefore it is expected that the demand of bottom layer half-tone mask will be increasing in future. Ulvac coating has developed two types of bottom layer half-tone mask blanks which half-tone layers are composed in Cr material or MoSi material respectively. Since each bottom layer half-tone mask blanks has different advantage in process and characteristics, it is possible to select half-tone mask blank by customer requirement. We will discuss process and characteristics of two types bottom layer half-tone mask blanks in this meeting.
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Narihiro Morosawa, Yasunori Noguchi, Satoru Mochizuki, and Kagehiro Kageyama "Recent bottom layered half-tone mask blanks development for large sized and high resolution flat panel displays", Proc. SPIE 10810, Photomask Technology 2018, 108101J (3 October 2018); https://doi.org/10.1117/12.2501511
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KEYWORDS
Chromium
Transmittance
Etching
Glasses
Flat panel displays
Wet etching
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