Translator Disclaimer
Open Access Paper
19 November 2018 Front Matter: Volume 10813
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10813 including the Title Page, Copyright information, Table of Contents, Author and Conference Committee lists.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Advanced Laser Processing and Manufacturing II, edited by Rongshi Xiao, Minghui Hong, Jian Liu, Proceedings of SPIE Vol. 10813 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510622241

ISBN: 9781510622258 (electronic)

Published by

SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA

Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445

SPIE.org

Copyright © 2018, Society of Photo-Optical Instrumentation Engineers.

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/18/$18.00.

Printed in the United States of America.

Publication of record for individual papers is online in the SPIE Digital Library.

00005_PSISDG10813_1081301_page_2_1.jpg

Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aoyagi, Eiji, 0K

Arnoult, X., 0U

Bai, Shi, 0O

Bi, Guijun, 0V

Böhm, M., 0U

Brajer, J., 0U

Cai, Jinguang, 0K

Chew, Youxiang, 0V

Cui, Bai, 0Q

Deng, Leimin, 0Q

Dong, Dongdong, 10

Gao, Yang, 0Z

Guo, Yanwu, 10

Han, Jitai, 0O

Hou, Kangle, 1A

Hu, Anming, 0O

Hu, Qianwu, 1A

Hu, Songtao, 10

Huang, Hongkun, 18

Ito, Shun, 0K

Jia, Beibei, 04

Jia, Shaohui, 04

Jiao, Junke, 04

Kang, Ziming, 0Z

Kaufman, J., 0U

Lai, Jiancheng, 18

Lee, Bing Yang, 0V

Li, Lingshan, 0Z

Liu, Jianguo, 13

Liu, Zhen, 0Z

Lu, Yongfeng, 0Q

Meng, Li, 1A

Mocek, T., 0U

Nastasi, Michael, 0Q

Ng, Fern Lan, 0V

Ogawa, Sayaka, 0K

Ouyang, Wentai, 04

Qin, Zhongli, 13

Rostohar, D., 0U

Su, Qiuyue, 0O

Wang, Dengzhi, 1A

Wang, Fei, 0Q

Wang, Weidong, 10

Watanabe, Akira, 0K

Weng, Fei, 0V

Xian, Chen, 1A

Xu, Zifa, 04

Yan, Xueliang, 0Q

Zeng, Xiaoyan, 13, 1A

Zhang, Chenfei, 0Q

Zhang, Dongyun, 0Z, 10

Zhang, Pudan, 0Z

Zhang, Wenwu, 04

Zheng, Chong, 0O

Zhu, Zhiguang, 0V

Zulić, S., 0U

Symposium Committees

General Chairs

  • Maryellen Giger, President, SPIE and The University of Chicago (United States)

  • Qihuang Gong, President, Chinese Optical Society and Peking University (China)

General Co-chairs

  • Arthur Chiou, National Yang-Ming University (Taiwan, China)

  • Guangcan Guo, Past President, Chinese Optical Society and University of Science and Technology of China (China)

  • Zejin Liu, Vice President, Chinese Optical Society and National University of Defense Technology (China)

Technical Program Chairs

  • Ruxin Li, Vice President, Chinese Optical Society and Shanghai Institute of Optics and Fine Mechanics (China)

  • Xingde Li, Johns Hopkins University (United States)

Technical Program Co-chairs

  • Tianchu Li, National Institute of Metrology (China)

  • Wei Huang, Northwestern Polytechnical University (China)

  • Ying Gu, Vice President, Chinese Optical Society and PLA General Hospital (China)

  • Huilin Jiang, Changchun University of Science and Technology (China)

Local Organizing Committee Chair

  • Xu Liu, Secretary General, Chinese Optical Society and Zhejiang University (China)

Local Organizing Committee Co-chairs

  • Wenqing Liu, Vice President, Chinese Optical Society and Anhui Institute of Optics and Fine Mechanics (China)

  • Guobin Fan, China Academy of Engineering Physics (China)

Local Organizing Committee

  • Xiaomin Ren, Vice President, Chinese Optical Society and Beijing University of Posts and Telecommunications (China)

  • Suotang Jia, Vice President, Chinese Optical Society and Shanxi University (China)

  • Wenjie Wang, Vice President, Chinese Optical Society and Sunny Group Company, Ltd. (China)

  • Qingming Luo, Huazhong University of Science and Technology (China)

  • Ping Jia, Changchun Institute of Optics, Fine Mechanics and Physics (China)

  • Wei Zhao, Xi’an Institute of Optics and Precision Mechanics (China)

  • Yudong Zhang, Chengdu Branch, Chinese Academy of Sciences (China)

  • Ninghua Zhu, Institute of Semiconductors (China)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Xiaocong Yuan, Shenzhen University (China)

  • Limin Tong, Zhejing University (China)

  • Weimin Chen, Chongqing University (China)

  • Yidong Huang, Tsinghua University (China)

  • Tiegen Liu, Tianjin University (China)

  • Zhiping Zhou, Peking University (China)

  • Changhe Zhou, Jinan University (China)

  • Yiping Cui, Southeast University (China)

  • Zhongwei Fan, Academy of Optoelectronics, CAS (China)

  • Xiaoying Li, Tianjin University (China)

  • Yan Li, Deputy Secretary General, Chinese Optical Society and Peking University (China)

  • Caiwen Ma, Xi’an Institute of Optics and Precision Mechanics (China)

  • Xinliang Zhang, Huazhong University of Science and Technology (China)

  • Jianxin Chen, Fujian Normal University (China)

  • Yihua Hu, College of Electronic Engineering, National University of Defense Technology (China)

Secretaries-General

  • Bo Gu, Deputy Secretary General, Chinese Optical Society (China)

  • Hong Yang, Deputy Secretary General, Chinese Optical Society and Peking University (China)

Executive Organizing Committee

  • David J. Bergman, Tel Aviv University (Israel)

  • Qionghai Dai, Tsinghua University (China)

  • Keisuke Goda, The University of Tokyo (Japan)

  • Qihuang Gong, Peking University (China)

  • Ying Gu, Chinese PLA General Hospital (China)

  • Guang-Can Guo, University of Science and Technology of China (China)

  • Byoung S. Ham, Gwangju Institute of Science and Technology (Korea, Republic of)

  • Sen Han, University of Shanghai for Science and Technology (China) and Suzhou H&L Instruments LLC (China)

  • Werner H. Hofmann, Technische Universität Berlin (Germany)

  • Minghui Hong, National University of Singapore (Singapore)

  • Bahram Jalali, University of California, Los Angeles (United States)

  • Shibin Jiang, AdValue Photonics, Inc. (United States)

  • Satoshi Kawata, Osaka University (Japan)

  • Tina E. Kidger, Kidger Optics Associates (United Kingdom)

  • Baojun Li, Jinan University (China)

  • Ming Li, Institute of Semiconductors (China)

  • Ruxin Li, Shanghai Institute of Optics and Fine Mechanics (China)

  • Xingde Li, Johns Hopkins University (United States)

  • Jian Liu, PolarOnyx, Inc. (United States)

  • Tiegen Liu, Tianjin University (China)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • Qingming Luo, Huazhong University of Science and Technology (China)

  • Yuji Sano, ImPACT (Japan)

  • Yunlong Sheng, Université Laval (Canada)

  • Kebin Shi, Peking University (China)

  • Tsutomu Shimura, The University of Tokyo (Japan)

  • Upendra N. Singh, NASA Langley Research Center (United States)

  • Michael G. Somekh, The Hong Kong Polytechnic University (Hong Kong, China)

  • Yuguo Tang, Suzhou Institute of Biomedical Engineering and Technology (China)

  • Masahiko Tani, University of Fukui (Japan)

  • Kimio Tatsuno, Koga Research Institute, Ltd. (Japan)

  • Kevin K. Tsia, The University of Hong Kong (Hong Kong, China)

  • Kazumi Wada, Massachusetts Institute of Technology (United States)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Rongshi Xiao, Beijing University of Technology (China)

  • Hongxing Xu, Wuhan University (China)

  • Toru Yoshizawa, Tokyo University of Agriculture and Technology (Japan) and 3D Associates (Japan)

  • Changyuan Yu, The Hong Kong Polytechnic University (Hong Kong, China)

  • Chongxiu Yu, Beijing University of Posts and Telecommunications (China)

  • Xiao-Cong Yuan, Shenzhen University (China)

  • Xiaoyan Zeng, Huazhong University of Science and Technology (China)

  • Cunlin Zhang, Capital Normal University (China)

  • Song Zhang, Purdue University (United States)

  • Xi-Cheng Zhang, University of Rochester (United States)

  • Xinliang Zhang, Wuhan National Laboratory for Optoelectronics (China)

  • Xuping Zhang, Nanjing University (China)

  • Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)

  • Zhiping Zhou, Peking University (China)

  • Dan Zhu, Huazhong University of Science and Technology (China)

  • Ning Hua Zhu, Institute of Semiconductors (China)

Conference Committee

Conference Chairs

  • Rongshi Xiao, Beijing University of Technology (China)

  • Minghui Hong, National University of Singapore (Singapore)

  • Jian Liu, PolarOnyx, Inc. (United States)

Conference Co-chairs

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • Yuji Sano, ImPACT (Japan)

Conference Program Committee

  • Anming Hu, The University of Tennessee Knoxville (United States)

  • Ting Huang, Beijing University of Technology (China)

  • Jonathan Lawrence, University of Chester (United Kingdom)

  • Akira Watanabe, Tohoku University (Japan)

  • Jianhua Yao, Zhejiang University of Technology (China)

  • Jianzhong Zhou, Jiangsu University (China)

Session Chairs

  • 1 Laser Welding, Cladding, and Additive Manufacturing I

    Peng Wen, Tsinghua University (China)

  • 2 Laser Welding, Cladding, and Additive Manufacturing II

    Zhu Liu, The University of Manchester (United Kingdom)

  • 3 Laser Cleaning and Modification

    Ting Huang, Beijing University of Technology (China)

  • 4 Laser Cutting and Drilling

    Zhu Liu, The University of Manchester (United Kingdom)

  • 5 Laser Micro-/Nanofabrication and Ultrafast Laser Processing

    Jinguang Cai, China Academy of Engineering Physics (China)

    Akira Watanabe, Tohoku University (Japan)

  • 6 Laser Shock Peening

    Yuji Sano, ImPACT (Japan)

  • 7 Laser Additive Manufacturing I

    Tomokazu Sano, Osaka University (Japan)

  • 8 Laser Additive Manufacturing II

    Bai Cui, University of Nebraska-Lincoln (United States)

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10813", Proc. SPIE 10813, Advanced Laser Processing and Manufacturing II, 1081301 (19 November 2018); https://doi.org/10.1117/12.2520998
PROCEEDINGS
12 PAGES


SHARE
Advertisement
Advertisement
Back to Top