High-quality lead sulfide nanofilm deposited on silica fiber substrate by atomic layer deposition technology

Xiangping Pan; Yanhua Dong; Jianxiang Wen; Jiajia Zheng; Caiyun Su; Tingyun Wang

doi:10.1117/12.2501054

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25 October 2018 High-quality lead sulfide nanofilm deposited on silica fiber substrate by atomic layer deposition technology

Xiangping Pan, Yanhua Dong, Jianxiang Wen, Jiajia Zheng, Caiyun Su, Tingyun Wang

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Proceedings Volume 10823, Nanophotonics and Micro/Nano Optics IV; 108230M (2018) https://doi.org/10.1117/12.2501054
Event: SPIE/COS Photonics Asia, 2018, Beijing, China

Abstract

High-quality lead sulfide (PbS) nanofilm was deposited on silica fiber substrate materials via atomic layer deposition (ALD) technology. The structure, morphology, and optical properties of PbS nanofilm were investigated. Scanning electron microscopy (SEM) result shows that the PbS nanomaterials had cubic phase and the size of nanoparticles were 50~100 nm. The Raman spectrum shows three peaks at 134, 425 and 966 cm^-1 , which further reveal the bonding modes between PbS and silica materials. In addition, spectral characteristics of the samples show the emission peak at 379 nm, with the excitation wavelength of 250 nm at room temperature.

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Xiangping Pan, Yanhua Dong, Jianxiang Wen, Jiajia Zheng, Caiyun Su, and Tingyun Wang "High-quality lead sulfide nanofilm deposited on silica fiber substrate by atomic layer deposition technology", Proc. SPIE 10823, Nanophotonics and Micro/Nano Optics IV, 108230M (25 October 2018); https://doi.org/10.1117/12.2501054

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