Near field optical lithography using ultra-small gap bowtie apertures

Liang Wang; Jin Qin

doi:10.1117/12.2504905

6 February 2019 Near field optical lithography using ultra-small gap bowtie apertures

Liang Wang, Jin Qin

Author Affiliations +

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108421A (2019) https://doi.org/10.1117/12.2504905
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

Near filed optical lithography has been a promising alternative to photolithography for its high resolution, low cost and high throughput. Bowtie aperture, one type of nanoscale ridge aperture, is widely used in near filed optical lithography. However, the bowtie structure milled by focused ion beam (FIB) usually suffers from non-vertical sidewall with taper and rounded corner due to Gaussian ion beam profile and redeposition effects. Here, we report a novel method to fabricate bowtie aperture with sub-15 nm gap, producing highly confined electric near-field by localized surface plasmon (LSP) excitation and nanofocusing of the closely tapered gap. Utilizing a passive flexure stage for contact control, we present our recent lithography results with a record 20 nm resolution (FWHM).

Citation Download Citation

Liang Wang and Jin Qin "Near field optical lithography using ultra-small gap bowtie apertures", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108421A (6 February 2019); https://doi.org/10.1117/12.2504905

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KEYWORDS

Lithography

Near field

Optical lithography

Photomasks

Silicon

Chromium

Finite-difference time-domain method

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