Electron Beam Generation Based On Negative Electron Affinity Photocathodes

Colin A. Sanford; Noel C. MacDonald

doi:10.1117/12.953076

19 July 1989 Electron Beam Generation Based On Negative Electron Affinity Photocathodes

Colin A. Sanford, Noel C. MacDonald

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953076
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A negative electron affinity (NEA) GaAs photocathode has been used to generate continuous and pulsed electron beams for electron microscopy and time resolved electron beam metrology. Short electron pulses are emitted from the photocathode when excited by a mode locked laser. Laser pulsing the cathode eliminates the need for complex electron beam blanking optics when performing time domain metrology. The GaAs photocathode exhibits a brightness comparable to LaB6 and is stable enough to display real time TV images in both the continuous and pulsed modes of operation. In the time resolved mode, the temporal resolution of the cathode is currently limited by the laser pulse duration, which is approximately 1 ns.

Citation Download Citation

Colin A. Sanford and Noel C. MacDonald "Electron Beam Generation Based On Negative Electron Affinity Photocathodes", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953076

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