Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks

Ginetto Addiego; William G. Oldham

doi:10.1117/12.953158

25 July 1989 Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks

Ginetto Addiego, William G. Oldham

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953158
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Experimental results of a high-resolution holographic imaging system using wave-front conjugation are demon-strated. Using an Argon laser operating at 488 nm with a coherence length of one meter, a hologram is formed from the information on a master mask that is imaged onto a high-resolution recording material with a photographic quality multi-element lens. The hologram is illuminated with a spatially and temporally filtered beam of light centered at 488 nm from a Hg arc lamp to construct the image of the master mask. The aberrations introduced by the imaging lens are eliminated through the process of reverse ray tracing back-through the original lens. The use of a spectrally-broad construction source reduces the effects of optical noise generated in the optical train during the construction of the image. Diffraction limited images are experimentally observed throughout the illuminated field.

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Ginetto Addiego and William G. Oldham "Diffraction Limited Imaging Using Incoherently Illuminated Holographic Masks", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953158

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KEYWORDS

Holograms

Holography

Imaging systems

Mirrors

3D image reconstruction

Diffraction

Image resolution

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