Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography

H. Oertel; M. Weiss; J. Chlebek; H. L. Huber; R. Dammel; C. R. Lindley; J. Lingnau; J. Theis

doi:10.1117/12.968537

1 August 1989 Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography

H. Oertel, M. Weiss, J. Chlebek, H. L. Huber, R. Dammel, C. R. Lindley, J. Lingnau, J. Theis

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968537
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The impact of statistical fluctuations due to the finite number of quanta absorbed during the exposure of high Ã¢â‚¬â€?speed X Ã¢â‚¬â€? ray photoresists on photoresist development and lithographic structure transfer is examined. Evidence for percolation processes during photoresist development is provided, and theoretical models are presented in the form of a Monte Ã¢â‚¬â€? Carlo type computer experiment, and a statistical analysis of surface clusters by means of a simple continuous Ã¢â‚¬â€? space percolation model. Finally achievable structure transfer is analyzed in terms of the optical and statistical components of the normalized process parameter NPL.

Citation Download Citation

H. Oertel, M. Weiss, J. Chlebek, H. L. Huber, R. Dammel, C. R. Lindley, J. Lingnau, and J. Theis "Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968537

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