Demonstration of alignment error-free pattering of tapered waveguide using fixed beam moving stage e-beam lithography

Viphretuo Mere; Shankar Kumar Selvaraja

doi:10.1117/12.2509150

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4 March 2019 Demonstration of alignment error-free pattering of tapered waveguide using fixed beam moving stage e-beam lithography

Viphretuo Mere, Shankar Kumar Selvaraja

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Proceedings Volume 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII; 109301B (2019) https://doi.org/10.1117/12.2509150
Event: SPIE OPTO, 2019, San Francisco, California, United States

Abstract

We present a method to write a tapered waveguide using fixed-beam-moving-stage (FBMS) in an electron-beam lithography system. FBMS allows writing of large patterns without stitch-error, however, restricts only a few primitive shapes. For patterning tapers, a combination of FMBS with area-mode is used that typically results in alignment errors. The proposed method offers smooth and alignment-error-free tapering of sub-micron featured Silicon waveguide. We experimentally demonstrate a fully FBMS patterned photonic circuit with power splitter, wire-to-slot coupler, slot waveguide and a slotted ring resonator. The device response with insertion loss -1.35dB is measured using a tunable laser source around 1550 nm wavelength.

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Viphretuo Mere and Shankar Kumar Selvaraja "Demonstration of alignment error-free pattering of tapered waveguide using fixed beam moving stage e-beam lithography", Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 109301B (4 March 2019); https://doi.org/10.1117/12.2509150

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