Advanced multilayer mirror design to mitigate EUV shadowing

Stuart Sherwin; Laura Waller; Andrew Neureuther; Patrick Naulleau

doi:10.1117/12.2515095

26 March 2019 Advanced multilayer mirror design to mitigate EUV shadowing

Stuart Sherwin, Laura Waller, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 1095715 (2019) https://doi.org/10.1117/12.2515095
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

In this work, we demonstrate a method to design the Mo-Si multilayer stack of an EUV photomask to increase the optical efficiency of shadowing-orientation equal lines and spaces imaged under dipole illumination. We achieve this using a computational framework written in the PyTorch machine learning library, which is capable of optimizing the multilayer for partially-coherent imaging rather than specular reflectivity. After computing optimal multilayer designs for both 0.33 and 0.55 NA EUV systems, we verify the improvements via RCWA simulation. We demonstrate optical efficiency gains of up to 22%=14% for the 0.33/0.55 NA systems, respectively.

Conference Presentation

Citation Download Citation

Stuart Sherwin, Laura Waller, Andrew Neureuther, and Patrick Naulleau "Advanced multilayer mirror design to mitigate EUV shadowing", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 1095715 (26 March 2019); https://doi.org/10.1117/12.2515095

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