Next generation of heated atomic force microscope cantilever for nanolithography: modelling, simulation, and nanofabrication

Mohammadreza Soleymaniha; Jonathan R. Felts

doi:10.1117/12.2514686

26 March 2019 Next generation of heated atomic force microscope cantilever for nanolithography: modelling, simulation, and nanofabrication

Mohammadreza Soleymaniha, Jonathan R. Felts

Author Affiliations +

Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580Q (2019) https://doi.org/10.1117/12.2514686
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

This paper reports the modelling, simulation and fabrication process of a novel heated atomic force microscope (AFM) cantilever. The fabricated cantilever is used for thermal dip pen nanolithography (t-DPN) applications where the heated AFM cantilever can deposit molten polymer. The ability to control the flow of the molten polymer via thermocapillary force during pattering is limited in current heated AFM cantilevers. We present a new design of the heated AFM cantilever to improve the patterning speed and provide the ability to control the flow rate of the polymer. In this paper, we focus on the nanofabrication part to explain different semiconductor fabrication process development and integration for manufacturing the heated AFM cantilevers.

Conference Presentation

Citation Download Citation

Mohammadreza Soleymaniha and Jonathan R. Felts "Next generation of heated atomic force microscope cantilever for nanolithography: modelling, simulation, and nanofabrication", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580Q (26 March 2019); https://doi.org/10.1117/12.2514686

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