Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao; Pedro Herrera; Vidya Ramanathan; Victoria Naipak; Meng Wang; Renan Milo; Tal Yaziv; Nir BenDavid; Chen Dror; Hao Mei; Weihua Li; Xindong Gao; Linfei Gao; Md. Motasim Bellah; Karsten Gutjahr; Dongyue Yang; Cheuk Wun Wong; Xueli Hao; Tony Joung; DeNeil Park; Yue Zhou; Abhishek Gottipati

doi:10.1117/12.2514548

26 March 2019 Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Author Affiliations +

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 1095906 (2019) https://doi.org/10.1117/12.2514548
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Shrinking on-product overlay (OPO) budgets in advanced technology nodes require more accurate overlay measurement and better measurement robustness to process variability. Pupil-based accuracy flags have been introduced to the scatterometry-based overlay (SCOL) system to evaluate the performance of a SCOL measurement setup. Wavelength Homing is a new robustness feature enabled by the continuous tunability of advanced SCOL systems using a supercontinuum laser light source in combination with a flexible bandpass filter. Inline process monitoring using accuracy flags allows for detection, quantification and correction of shifts in the optimal measurement wavelength. This work demonstrates the benefit of Wavelength Homing in overcoming overlay inaccuracy caused by process changes and restoring the OPO and residual levels in the original recipe.

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Citation Download Citation

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, and Abhishek Gottipati "Process drift compensation by tunable wavelength homing in scatterometry-based overlay", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095906 (26 March 2019); https://doi.org/10.1117/12.2514548

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