Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)

Charles S. Bevis; Robert Karl Jr.; Bin Wang; Peter Johnsen; Michael Tanksalvala; Christina Porter; Yuka Esashi; Henry Kapteyn

doi:10.1117/12.2517026

26 March 2019 Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)

Charles S. Bevis, Robert Karl Jr., Bin Wang, Peter Johnsen, Michael Tanksalvala, Christina Porter, Yuka Esashi, Henry Kapteyn

Author Affiliations +

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109590W (2019) https://doi.org/10.1117/12.2517026
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

My apologies, the technical abstract will be submitted next week.

Conference Presentation

Citation Download Citation

Charles S. Bevis, Robert Karl Jr., Bin Wang, Peter Johnsen, Michael Tanksalvala, Christina Porter, Yuka Esashi, and Henry Kapteyn "Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590W (26 March 2019); https://doi.org/10.1117/12.2517026

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